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  OPTICONs "DEEM" Spectromicroscope qualified as a "BREAKING NEWS!" at the International Vacuum Congress IVC19, 9-13 September 2013 in Paris !

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DualEEM: a novel surface science technique for simultaneous ultrafast electron spectromicroscopy, nanospectroscopy and diffraction

Krzysztof P. Grzelakowski

OPTICON Nanotechnology

Muchoborska 18, PL54-424 Wrocław, Poland

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We present experimental proof of the novel dual emission electron microscopy (DEEM) technique [1] based on photoemission (PEEM) [2] and low energy electron microscopy    (LEEM) [3]. DualEEM utilizes the idea of the aberration free spherical analyzer α-SDA [4], that assures not only the selection of characteristic energy for imaging, but also an electron optical separation into two imaging channels: energy-selective real image and reciprocal (diffraction) image. Their quasi- simultaneous acquisition in DualEEM offers an unique opportunity to investigate ultrafast dynamic processes on the surface under these two aspects on the sub-femtosecond scale [5]. The idea and its realization is illustrated in Fig.1. An electron gun located inside the immersion objective lens (b) allows a unique electron beam sample illumination and thus, opens a new application field for electron spectromicroscopy under laboratory conditions.

fig1 paris

 

Fig. 1. Modus operandi: α-rays (black), γ (blue), p1,p2: real and diffraction plane, respectively: a) E- selective k-projection, upper hemisphere switched off, b) E- selective real image mode, both hemispheres switched on, c) General appearance of the assembled flange-on DualEEM oriented as ‘a’ and ‘b’

The first test results (<45nm resolution in the spectroscopic modus) obtained from 2μm Pd/Si in ultrahigh vacuum are collected and described in Fig.2. (final res. <10nm, ΔE<100meV)

 

fig2 ivc paris3

 

Fig.2. Pd/Si, FoV of ‘a’ ~ 7,5μm, pass energy=700eV, top: UV(Hg) illumination, ΔE: 400meV,              disp.apt. :~80μm, a) E- selective real image, screen1; b) E-selective K-projection, screen2.                                                                                                                                                                                              bottom: selected area microspectroscopic analysis for two characteristic energy ranges that utlizes a unique method for sample electron beam illumination [1], Fig.1b.

 

  1. 1.K.P. Grzelakowski, Ultramicroscopy 130 (2013) 29
  2. 2.E. Brueche, Z.Phys. 86  (1933) 448
  3. 3.E. Bauer, Proc.of the 5thInt. Cong. for Electron Micr.(Academic, N.Y., 1962, p.D-11)
  4. 4.K.P. Grzelakowski, Ultramicroscopy 116 (2012) 95
  5. 5.K.P. Grzelakowski, R. M. Tromp, Ultramicroscopy 130 (2013) 36

 

Exhibition booth in Vienna                ...
new results   The DEEM resolution is continously improving towards 10nm!
PICO 2013 TWO CONTRIBUTIONS OF OPTICON NANOTECHNOLOGY AT PICO 2013 CONFERENCE PICO 2013: Kasteel...
 
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